Silicon nitride coatings prepared by low pressure plasma CVD.
نویسندگان
چکیده
منابع مشابه
Low-pressure CVD and Plasma- Enhanced CVD
LPCVD is a process used in the manufacturing of the deposition of thin films on semiconductors usually ranging from a few nanometers to many micrometers. LPCVD is used to deposit a wide range of possible film compositions with good conformal step coverage. These films include a variety of materials including polysilicon for gate contacts, thick oxides used for isolation, doped oxides for global...
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ژورنال
عنوان ژورنال: SHINKU
سال: 1988
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.31.167